Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure ...
Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...
As shown in the above figure, energy beam-based direct and assisted polishing technologies utilize lasers, ion beams, or plasma to ablate, impact, or modify the diamond surface, thereby reducing ...
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